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PlasmaPro 1000 PECVD

Maximised large area etching and deposition production solutions

  • Exceptional batch size
  • High throughput
  • Optimum device quality
  • Low cost of ownership
  • Available in load lock or cluster configurations with up to 3 chambers
  • Vacuum load lock as standard with cluster capability options

  • Excellent uptime
  • High quality device performance and yield


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The LED industry justifiably demands high throughput, device quality and lower cost of ownership. The PlasmaPro 1000 offers all these solutions.

The PlasmaPro 1000 tools provide outstanding benefits for LED manufacturers

490mm electrode - Unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers

Reliable hardware and ease of serviceability - Excellent uptime

Maximised clamping - Enhanced wafer cooling

Z-movement electrode - Ultimate uniformity

Dual entry gas inlet - Easy process tuning

Unique carrier plate design - Efficient cooling of every wafer with minimal edge exclusion while being easy to use and maintain

High-conductance radial (axial symmetric) pumping configuration - Guaranteed enhanced process uniformity and rates are

  • High quality PECVD of silicon nitride and silicon dioxide for photonics, dielectric layers, passivation and many other uses
  • Hard mask deposition and etch for high brightness LED production
Download PlasmaPro 1000 Brochure

Global Customer Support

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

  • Remote diagnostics software provides quick and easy fault diagnosis and resolution.
  • Support contracts are available to suit the budget and situation.
  • Global spares in strategic locations for quick response.
Find out more

Related Applications

FabricationFabrication and Characterisation of Light Emitting DevicesBioMEMS Fabrication

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