Next Generation Datacomms with Ultrafast Photonics Devices
Researchers at AMO GmbH have used Oxford Instruments Plasma Technology’s…
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Maximised large area etching and deposition production solutions
The LED industry justifiably demands high throughput, device quality and lower cost of ownership. The PlasmaPro 1000 offers all these solutions.
The PlasmaPro 1000 tools provide outstanding benefits for LED manufacturers
490mm electrode - Unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers
Reliable hardware and ease of serviceability - Excellent uptime
Maximised clamping - Enhanced wafer cooling
Z-movement electrode - Ultimate uniformity
Dual entry gas inlet - Easy process tuning
Unique carrier plate design - Efficient cooling of every wafer with minimal edge exclusion while being easy to use and maintain
High-conductance radial (axial symmetric) pumping configuration - Guaranteed enhanced process uniformity and rates are
PlasmaPro 1000 Astrea
Designed specifically for the harsh chemistries required for LED materials, the PlasmaPro1000 Astrea delivers fast etch rates uniformly across large wafer batches. It has also been developed with uptime and ease of serviceability in mind.
PlasmaPro 1000 Stratum PECVD system
The PlasmaPro 1000 Stratum PECVD has been specifically developed for passivation deposition in LED production. Its large area electrode and optimised showerhead design allows up to 61 x 2”, 15 x 4” or 7 x 6” wafers in a single load.
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