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PlasmaPro 1000

Maximised large area etching and deposition production solutions

  • Exceptional batch size
  • High throughput
  • Optimum device quality
  • Low cost of ownership
  • Available in load lock or cluster configurations with up to 3 chambers
  • Vacuum load lock as standard, with open load and cluster capability options
  • Excellent uptime
  • High quality device performance and yield


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The LED industry justifiably demands high throughput, device quality and lower cost of ownership. The PlasmaPro 1000 offers all these solutions.

The PlasmaPro 1000 tools provide outstanding benefits for LED manufacturers

490mm electrode - Unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers

Reliable hardware and ease of serviceability - Excellent uptime

Maximised clamping - Enhanced wafer cooling

Z-movement electrode - Ultimate uniformity

Dual entry gas inlet - Easy process tuning

Unique carrier plate design - Efficient cooling of every wafer with minimal edge exclusion while being easy to use and maintain

High-conductance radial (axial symmetric) pumping configuration - Guaranteed enhanced process uniformity and rates are

  • High quality PECVD of silicon nitride and silicon dioxide for photonics, dielectric layers, passivation and many other uses
  • Hard mask deposition and etch for high brightness LED production
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PlasmaPro 1000 Astrea

Designed specifically for the harsh chemistries required for LED materials, the PlasmaPro1000 Astrea delivers fast etch rates uniformly across large wafer batches. It has also been developed with uptime and ease of serviceability in mind.

PlasmaPro 1000 Stratum PECVD system

The PlasmaPro 1000 Stratum PECVD has been specifically developed for passivation deposition in LED production. Its large area electrode and optimised showerhead design allows up to 61 x 2”, 15 x 4” or 7 x 6” wafers in a single load.

Related Applications

FabricationFabrication and Characterisation of Light Emitting DevicesBioMEMS Fabrication

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