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Atomic Layer Deposition (ALD) Systems

Oxford Instruments’ ALD product family offers a unique range of flexibility and capability in the engineering of nanoscale structures and devices by combining remote plasma ALD processes with thermal ALD.

Products

The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes…

FlexAL ALD

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Atomfab delivers fast, low damage, low COO production plasma ALD processing for GaN power and RF devices.

Atomfab ALD

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