2 Dimensional (2D) materials exist at the very limit of thin film dimensions with thicknesses down to a single atom limit. These materials exhibit superlative electronic and optoelectronic properties which researchers today are working on harnessing for next generation devices.
Oxford Instruments provides solutions that make many of these innovations possible, plasma etch and deposition are the corner stone techniques for making semiconductor devices. While exciting new 2D materials such as graphene and MoS2, made using plasma CVD and ALD, can offer devices that push the performance boundaries ever further.
Atomic Layer Deposition of 2D materials beyond graphene.
Atomic Layer Etching (ALE) for e.g. MoS2
Reactive Ion Etching (RIE/ ICP RIE) to create device channels/mesas/nanostructures.