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  3. ICP Etching

ICP Etching Systems

The Cobra® ICP etching sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

Products

The PlasmaPro 100 range of etch and deposition tools can be fitted with a variety of substrate electrodes, enabling processes over a wide temperature range. They offer a 200mm platform…

PlasmaPro 100 Cobra

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An evolution in single wafer etch technology

With extensive experience of etching materials such as GaN, SiC and Sapphire, our technologies enable the…

PlasmaPro 100 Polaris

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The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 ICP

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