Part of the Oxford Instruments Group
Expand
Oxford Instruments
Applications
Products
News
Events
Contact
SustainabilityInvestorsCareersNewsEventsContact
Investors Careers
About Us
Our FacilityNewsEventsSolutions for ProductionSolutions for Research
Markets
2D MaterialsAugmented RealityBiomedical DevicesFailure Analysis
HBLEDsInfrared SensorsLasersVCSELs
MEMS & SensorsPower DevicesQuantum TechnologyRF Devices
Technologies
Plasma EtchingReactive Ion EtchingRIE-PEICP Etching
Ion Beam
IBDIBE
Plasma deposition
PECVDICPCVDCVD
Atomic scale
Atomic Layer DepositionAtomic Layer EtchingAtomic Scale Processing
Materials & ProcessesSiCSiO2Al2O3CrAlGaN/GaNBrowse more...
Products
ICP EtchPlasmaPro 80 ICPPlasmaPro 100 CobraPlasmaPro 100 PolarisRIEPlasmaPro 80 RIEPlasmaPro 100 RIEPlasmaPro 800 RIE
Deep Si Etch
PlasmaPro 100 Estrelas
PECVDPlasmaPro 80 PECVDPlasmaPro 100 PECVDPlasmaPro 800 PECVDICPCVDPlasmaPro 80 ICPCVDPlasmaPro 100 ICPCVDCVDPlasmaPro 100 Nano
ALDAtomfabFlexAL
ALE
PlasmaPro 100 ALE
Ion Beam
Ionfab IBEIonfab IBD
PTIQ Advert
Library
BlogProcess NewsVideosWebinarsWhite PapersCustomer Gallery
Support
Service & Support
Service AgreementsUpgrades & SoftwareNEW: PTIQ SoftwareSparesTrainingTeamviewer
Raise a Support Ticket
Contact Us
PTIQ
Contact Us
Shop
UK
News
Events
Contact
eCommerce
  1. Home
  2. Products
  3. ICP Etching Systems

ICP Etching Systems

The Cobra® ICP etching sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

Products

The PlasmaPro 100 Cobra ICP Etch utilises high-density plasma to achieve fast etching and deposition rates. The process modules offer excellent uniformity, high-throughput, high-precision…

PlasmaPro 100 Cobra ICP Etch

Find out more

An evolution in single wafer etch technology.

With extensive experience of etching materials such as GaN, SiC and Sapphire, our technologies enable the…

PlasmaPro 100 Polaris

Find out more

The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 ICP

Find out more

© Oxford Instruments 2020

Website by Miramar Communications Ltd