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  3. ICP Etching Systems

ICP Etching Systems

The Cobra® ICP etching sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

Products

The PlasmaPro 100 Cobra ICP utilises high-density plasma to achieve fast etching and deposition rates. The process modules offer excellent uniformity, high-throughput, high-precision…

PlasmaPro 100 Cobra

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An evolution in single wafer etch technology

With extensive experience of etching materials such as GaN, SiC and Sapphire, our technologies enable the…

PlasmaPro 100 Polaris

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The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 ICP

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