Part of the Oxford Instruments Group
Expand
Oxford Instruments
Applications
Products
News
Events
Contact
SustainabilityInvestorsCareersNewsEventsContact
Investors Careers
About Us
Our FacilityNewsEventsSolutions for ProductionSolutions for ResearchSustainability
Applications
2D MaterialsAugmented RealityBiomedical DevicesFailure AnalysisHBLEDs
MEMS & SensorsInfrared SensorsLasersMicro-LEDs
Power DevicesQuantum TechnologyRF DevicesVCSELs
Technologies
Plasma EtchingReactive Ion EtchingRIE-PEICP RIE EtchingDeep Reactive Ion Etching
Ion Beam
Ion Beam DepositionIon Beam Etching
Plasma deposition
PECVDICPCVDCVD
Atomic scale
Atomic Layer DepositionAtomic Layer EtchingAtomic Scale Processing
Materials & ProcessesSiCSiO2Al2O3CrAlGaN/GaNBrowse more...
Products
ICP RIE EtchPlasmaPro 80 ICPPlasmaPro 100 Cobra ICPPlasmaPro 100 Polaris ICPRIEPlasmaPro 80 RIEPlasmaPro 100 RIEPlasmaPro 800 RIE
Deep Si Etch
PlasmaPro 100 Estrelas DSiE
PECVDPlasmaPro 80 PECVDPlasmaPro 100 PECVDPlasmaPro 800 PECVDICPCVDPlasmaPro 80 ICPCVDPlasmaPro 100 ICPCVDCVDPlasmaPro 100 Nano CVD
ALDAtomfab ALDFlexAL ALD
ALE
PlasmaPro 100 ALE
Ion Beam
Ionfab IBEIonfab IBD
Software
PTIQ Software
Colour Centres Quantum White Paper - Oxford Instruments
Library
BlogProcess NewsVideosWebinarsWhite PapersCustomer GalleryCustomers' Publication
Support
Service & Support
Service AgreementsUpgrades & SoftwarePTIQ SoftwareSparesTeamviewer
Training CoursesBasic Training CoursesIntermediate Level CoursesAdvanced Level CoursesStandalone Training Modules
Raise a Support Ticket
Contact Us
Oxford Instruments - TSIA STAR Awards Finalist
Contact Us
Shop
UKEuropeUS & CanadaAsiaJapan
News
Events
Contact
eCommerce
  1. Home
  2. Products
  3. ICP Etching Systems

ICP RIE Etching Systems

The Cobra® ICP etching sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

Products

The PlasmaPro 100 Cobra ICP RIE Etch utilises high-density plasma to achieve fast etching and deposition rates. The process modules offer excellent uniformity, high-throughput, high-precision…

PlasmaPro 100 Cobra ICP RIE Etch

Find out more

An evolution in single wafer etch technology. With extensive experience in etching materials such as GaN, SiC and Sapphire, our technologies enable the cost of ownership and yield…

PlasmaPro 100 Polaris ICP RIE

Find out more

The PlasmaPro 80 ICP RIE is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 ICP RIE

Find out more

© Oxford Instruments 2021

Website by Miramar Communications Ltd