Multiple choices of etch processes:
A wide range of materials can be etched, including:
||Load locked or cassette|
|Substrates||Up to 240mm
||Up to 460mm
||200mm with carriers options available for multi-wafers or small pieces|
|MFC controlled gaslines||8 or 12 line gas box available|
|Wafer stage temperature range||-150°C to 400°C
||10°C to 80°C||-150°C to 400°C|
|He Back side cooling option||Yes||No||Yes|
We had the honour to discuss with Dr Oscar Kennedy, UCLQ Postdoctoral Fellow, and Dr Wing Ng, Senior Research Fellow, from University College London (UCL) about their latest research projects and how they use our PlasmaPro® 80 RIE system.
Dr Oscar Kennedy has used PlasmaPro RIE system to create superconducting circuit by etching the superconducting NbN film, whereas Dr Wing Ng has used the RIE system to accurately pattern a 50 nm gap with smooth sidewalls between a pair of waveguides for chip‑based optical buffers. Read the case study to learn more.