FlexAL ALD

The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes gases, and hardware configuration within a single process chamber.

Remote plasma for low damage plasma ALD combined with thermal ALD in one deposition chamber
RF biased electrode option available for control of film properties
Industry-standard cassette to cassette handling for higher throughput
Maximum flexibility in the choice of precursors, process gases, hardware features and options
Optimised to maintain low-damage, high-quality substrates
Low temperature to enable high-quality deposition on temperature-sensitive surfaces

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Features
Applications

The ALD product family encompasses a range of tools to meet the varied demands of academia, corporate R&D and small scale production.

Oxford Instruments has an extensive process library, and new processes are continually being developed. We provide free on-going process support for the lifetime of any ALD tool, offering advice on developing new materials and continued access to our latest ALD process developments including new process recipes.

Chamber ports/windows for the integration of in-situ analysis equipment, e.g. ellipsometry
Automated single-wafer load-lock for loading of substrates up to 200 mm
Clusterable with additional process modules with vacuum transfer between chambers
Cleanroom interface available for through-wall installation
Ozone generator available for integration
Wide range of electrode options – grounded and biased electrodes
300W or 600W plasma source generators

Superconducting nitrides for quantum devices
GaN HEMT pre-treatment and passivation
High quality high-k gate oxides for graphene passivation
ALD of 2D transition metal dichalcogenides (TMDCs)
Pinhole-free passivation layers for OLEDs and polymers
Passivation of crystalline silicon solar cells
ALD moisture barriers and passivation of sensitive substrates
Highly conformal coatings for microfluidic devices

Image Source (at the right):

Conformal deposition of SiO₂, TiO₂ and Al2O₃ by Plasma ALD, (CC BY 4.0 license), image library at www.AtomicLimits.com, 2021

Conformal deposition of SiO2, TiO2 and Al2O3 by Plasma ALD

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Global Customer Support

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

Remote diagnostics software provides quick and easy fault diagnosis and resolution.
Support contracts are available to suit the budget and situation.
Global spares in strategic locations for quick response.

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Options

FlexAL2D

The FlexAL2D system provides ALD of 2D transition metal dichalcogenides (TMDCs) for nanodevice applications and offers a number of benefits for growth of 2D materials

2D Materials Growth