Part of the Oxford Instruments Group
The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-quality plasma ALD and thermal ALD processes with maximum flexibility in precursors, processes gases, and hardware configuration within a single process chamber.
Remote plasma for low damage plasma ALD combined with thermal ALD in one deposition chamber
RF biased electrode option available for control of film properties
Industry-standard cassette to cassette handling for higher throughput
Maximum flexibility in the choice of precursors, process gases, hardware features and options
Optimised to maintain low-damage, high-quality substrates
Low temperature to enable high-quality deposition on temperature-sensitive surfaces
The ALD product family encompasses a range of tools to meet the varied demands of academia, corporate R&D and small scale production.
Oxford Instruments has an extensive process library, and new processes are continually being developed. We provide free on-going process support for the lifetime of any ALD tool, offering advice on developing new materials and continued access to our latest ALD process developments including new process recipes.
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
The FlexAL2D system provides ALD of 2D transition metal dichalcogenides (TMDCs) for nanodevice applications and offers a number of benefits for growth of 2D materials
2D Materials Growth
Robust ALD Processes for 2D Materials
Tunable Morphology
Gas pod - incorporate extra gas lines and allow greater flexibility
Logviewer software - datalogging software allows realtime graphing and post run analysis
Optical end point detectors - an important tool for achieving optimal process results
X20 Control System - delivers a future proof, flexible and reliable tool with increased system ‘intellect’
Dual CM gauge switching - provides the ability to utilise two differing ranges of capacitance manometer via a single pressure control valve
© Oxford Instruments 2021
