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White Paper
Atomic Layer Deposition for Quantum Devices

As the transistor gave rise to the information age, quantum technology has the potential to be the next great leap forward. Quantum technology is the application of quantum physics for real-world applications, such as quantum computing, sensing, navigation and communication.

Conventional methods for depositing superconductors include sputtering, pulsed laser deposition (PLD), and chemical vapour deposition (CVD). However, these methods can suffer from drawbacks including a lack of thickness control, poor uniformity and high impurity content.

Atomic layer deposition (ALD) is much more beneficial for thin-film deposition due to its ability to produce films with high purity, precise thickness control, conformal coating in high aspect ratio structures, and uniformity over large-area substrates.

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Dr Mark Dineen
Technical Marketing Manager at Plasma Technology

Dr Harm Knoops
Atomic Scale Segment Specialist at Plasma Technology

Dr Tania Hemakumara
Product Development Engineer at Plasma Technology