PlasmaPro 80 ICP RIE

PlasmaPro 80 ICP with operator using software

The PlasmaPro 80 ICP RIE is a compact, small footprint system offering versatile ICP etch solutions with convenient open loading. It is easy to site and easy to use, with no compromise on process quality. The open load design allows fast wafer loading and unloading, ideal for research, prototyping and low-volume production. It enables high-performance processes using optimised electrode cooling and excellent substrate temperature control.

Open load design allows fast wafer loading and unloading
Excellent etch control and rate determination
Excellent wafer temperature uniformity
Up to 200mm wafers
Low cost of ownership
Built to Semi S2/S8 standards

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Applications
Features

III-V etch processes
Silicon Bosch and cryo-etch processes
SiO₂ and quartz etch
Failure analysis dry etch de-processing ranging from packaged chip and die etch through to full 200mm wafer etch
Hard mask deposition and etch for high brightness LED production

Top dielectric layer removed, exposing four metal layers

Low damage FA etching in the ICP65

Small footprint - Easy to site
Optimised electrode cooling - Substrate temperature control
High-conductance radial (axially symmetric) pumping configuration - Guaranteed enhanced process uniformity and rates are
Addition of < 500ms data logging - Traceability and history of chamber and process conditions
Close-coupled turbo pump - High pumping speed and excellent base pressure
Clear ease of access to key components - Improved serviceability and maintenance
X20 control system - Greatly increases data retrieval and delivers faster, more repeatable matching
Fault and tool diagnostics via front end software - Rapid fault diagnosis
Laser end-point detection using interferometry - Measure etch depth in transparent materials on reflective surfaces (for example, oxides on Si), or reflectometry for non-transparent materials (such as metals) to determine layer boundaries
Optical emission spectrometry (OES) for large sample or batch process end-pointing - Detecting changes in etch by-products or depletion of reactive gas species, and for chamber clean end-pointing

Global Customer Support

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

Remote diagnostics software provides quick and easy fault diagnosis and resolution.
Support contracts are available to suit the budget and situation.
Global spares in strategic locations for quick response.

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