Products

Product Groups (None Selected)

ALD

ALD

Excellent process control
Superb thin film barrier properties
Virtually pin-hole free films

ALE

ALE

High selectivity
Low damage
Excellent uniformity

PlasmaPro 100 ALE and Etchpoint

PlasmaPro 100 ALE and Etchpoint

DSiE

DSiE

Precision etch processes
High selectivity
High aspect ratio

Ion Beam Systems

Ion Beam Systems

Multiple wafer handling options
Multiple mode functionality
Single wafer loadlock or cluster wafer handling

ICP Etching Systems

ICP Etching Systems

High density
Low pressure
Wide temperature range

ICPCVD

ICPCVD

Excellent quality
Low damage films
Wide temperature range

CVD Systems

CVD Systems

Cold wall design with showerhead
Excellent temperature uniformity
Up to 1200^oC

PECVD

PECVD

Excellent uniformity
High rate films
Excellent control of film properties

RIE Etching

RIE Etching

Anisotropic dry etching
Fast and consistent etching
High pumping capacity

Loading...

Latest news:

Oxford Instruments Partners with NYU Nanofab to Pioneer Atomic-Scale…

Oxford Instruments has partnered with NYU Nanofabrication Cleanroom to…

Read full article >

Oxford Instruments Teams with AOI to Boost Its Optoelectronic Device…

Oxford Instruments, a leading provider of advanced plasma processing solutions,…

Read full article >

Oxford Instruments opens new technical training suite at state-of-the-art…

Oxford Instruments (OXIG), a leading provider of advanced plasma processing…

Read full article >

Oxford Instruments and Quantemol announce plasma modelling R&D collaboration…

Oxford Instruments and Quantemol announce plasma modelling R&D collaboration…

Read full article >

Upcoming events: