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Product Groups (None Selected)
ALD

ALD

  • Excellent process control
  • Superb thin film barrier properties
  • Virtually pin-hole free films
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Details
ALE

ALE

  • High selectivity
  • Low damage
  • Excellent uniformity
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Details
DSiE

DSiE

  • Precision etch processes
  • High selectivity
  • High aspect ratio
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Details
Ion Beam Systems

Ion Beam Systems

  • Multiple wafer handling options
  • Multiple mode functionality
  • Single wafer loadlock or cluster wafer handling
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Details
ICP Etching Systems

ICP Etching Systems

  • High density
  • Low pressure
  • Wide temperature range
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Details
ICPCVD

ICPCVD

  • Excellent quality
  • Low damage films
  • Wide temperature range
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Details
CVD Systems

CVD Systems

  • Cold wall design with showerhead
  • Excellent temperature uniformity
  • Up to 1200oC
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Details
PECVD

PECVD

  • Excellent uniformity
  • High rate films
  • Excellent control of film properties
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Details
RIE Etching

RIE Etching

  • Anisotropic dry etching
  • Fast and consistent etching
  • High pumping capacity
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