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Products


Product Groups (None selected)

ALD

  • Excellent process control
  • Superb thin film barrier properties
  • Virtually pin-hole free films
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Details

ALE

  • High selectivity
  • Low damage
  • Excellent uniformity
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Details

DSiE

  • Precision etch processes
  • High selectivity
  • High aspect ratio
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Details

IBD

  • Multiple wafer handling options
  • Multiple mode functionality
  • Single wafer loadlock or cluster wafer handling
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Details

IBE

  • Multiple wafer handling options
  • Multiple mode functionality
  • Single wafer loadlock or cluster wafer handling
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Details

ICP Etch

  • High density
  • Low pressure
  • Wide temperature range
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Details

ICPCVD

  • Excellent quality
  • Low damage films
  • Wide temperature range
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Details

Nanoscale Growth

  • Cold wall design with showerhead
  • Excellent temperature uniformity
  • Up to 1200oC
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Details

PECVD

  • Excellent uniformity
  • High rate films
  • Excellent control of film properties
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Details

RIE

  • Anisotropic dry etching
  • Fast and consistent etching
  • High pumping capacity
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Details
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