We are proud of the ground-breaking R&D our customers are doing on our systems and we want to spread the word of their work.
Our customer's research has a huge contribution towards technological advancements that positively impact many disciplines from novel optoelectronics and quantum technologies to advanced materials.
If you like to send us your published research, please complete the form and submit your abstract, including how the Oxford Instruments deposition or etch system has been used in the course of your work.Submit Your Publication Link
Creation of regular arrays of faceted AlN nanostructures via a combined top-down, bottom-up approach - R.Armstrong, P-M.Coulon, P.Bozinakis, R.W.Martin, P.A.Shields
High Power Si Sidewall Heaters for Fluidic Applications Fabricated by Trench-Assisted Surface Channel Technology - H. Veltkamp, Y. Zhao, M. J. de Boer, R. G. P. Sanders, R. J. Wiegerink and J. C. Lötters
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 - Karsten Arts, Harvey Thepass, Marcel A. Verheijen, Riikka L. Puurunen, Wilhelmus M. M. Kessels, Harm C. M. Knoops