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Our Customers' Research
Publications Database

We are proud of the ground-breaking R&D our customers are doing on our systems and we want to spread the word of their work.

Our customers' research has a huge contribution towards technological advancements that positively impact many disciplines from novel optoelectronics and quantum technologies to advanced materials.

If you like to send us your published research, please complete the form and submit your publication link, including the Oxford Instruments deposition or etch system that has been used in the course of your work.

Submit Your Publication Link
WHAT DO YOU NEED TO DO?
  • Complete the online form with your details
  • Submit the process technology and the Oxford Instruments Plasma Technology system
  • Submit the publication link

You will get the chance to enter in a draw to WIN £200 of Amazon vouchers. Every 3 months one paper will be drawn randomly to win the Amazon voucher.

Our Customers' Published Research

Publication Date

Research Paper

Authors & Publication Link

Used OI system/technology

 

Applications

September 2021

Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide

Hanno Kröncke, Florian Maudet, Sourish Banerjee, Jürgen Albert, Sven Wiesner, Veeresh Deshpande, and Catherine Dubourdieu

FlexAL ALD

Semiconductors

July 2021

Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Bárbara Canto, Martin Otto, Michael J. Powell, Vitaliy Babenko, Aileen O'Mahony, Harm C. M. Knoops, Ravi S. Sundaram, Stephan Hofmann, Max C. Lemme, Daniel Neumaier

Atomfab ALD, FlexAL ALD

2D Materials, Optoelectronics, NEMS

April 2021

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Karsten Arts, Harvey Thepass, Marcel A. Verheijen, Riikka L. Puurunen, Wilhelmus M. M. Kessels, Harm C. M. Knoops

FlexAL ALD

Semiconductors

February 2021

Selective etching of p-GaN over Al0.25Ga0.75N in Cl2/Ar/O2 ICP plasma for fabrication of normally-off GaN HEMTs

Andrzej Taube, Maciej Kamiński, Marek Ekielski, Renata Kruszka, Joanna Jankowska-Śliwińska, Paweł P. Michałowski, Joanna Zdunek, and Anna Szerling

Plasmalab 100 ICP 180

Discretes (GaN PE/RF)

October 2020

Creation of regular arrays of faceted AlN nanostructures via a combined top-down, bottom-up approach

R.Armstrong, P-M.Coulon, P.Bozinakis, R.W.Martin, P.A.Shields

PlasmaPro 100 Cobra ICP Etching

Optoelectronics, Quantum, Semiconductors

August 2020

Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity

Marc J. M. Merkx, Sander Vlaanderen, Tahsin Faraz, Marcel A. Verheijen, Wilhelmus M. M. Kessels, and Adriaan J. M. Mackus

FlexAL ALD

Semiconductors

April 2020

Polarity dependence in Cl2-based plasma etching of GaN, AlGaN and AlN

Matthew D. Smith, Xu Li, Michael J. Uren, Iain G. Thayne, Martin Kuball

PlasmaPro 80 ICP Etching

Optoelectronics, Power Devices, Quantum, RF Devices

February 2020

Development of low-loss TiO2 waveguides

I. Hegeman, M. Dijkstra, F. B. Segerink, W. Lee, and S. M. Garcia-Blanco

PlasmaPro 100 RIE

Optoelectronics

December 2019

Tuning high-Q superconducting resonators by magnetic field reorientation

Christoph W. Zollitsch, James O’Sullivan, Oscar Kennedy, Gavin Dold, and John J. L. Morton

PlasmaPro 100 RIE

Quantum

October 2019

High Power Si Sidewall Heaters for Fluidic Applications Fabricated by Trench-Assisted Surface Channel Technology

H. Veltkamp, Y. Zhao, M. J. de Boer, R. G. P. Sanders, R. J. Wiegerink and J. C. Lötters

PlasmaPro 100 Estrelas (Bosch-based DRIE), Ionfab IBE, PlasmaPro 80 PECVD

Micro Electro Mechanical Systems (MEMS)

May 2018

High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching

Sabbir A. Khan, Dmitry B. Suyatin, Jonas Sundqvist, Mariusz Graczyk, Marcel Junige, Christoffer Kauppinen, Anders Kvennefors, Maria Huffman, and Ivan Maximov

Plasmalab 100 ALE

Quantum

March 2018

Tuning Material Properties of Oxides and Nitrides by Substrate. Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Tahsin Faraz, Harm C. M. Knoops, Marcel A. Verheijen, Cristian A. A. van Helvoirt, Saurabh Karwal, Akhil Sharma, Vivek Beladiya, Adriana Szeghalmi, Dennis M. Hausmann, Jon Henri, Mariadriana Creatore, and Wilhelmus M. M. Kessels

FlexAL ALD

Semiconductors

August 2017

Atomic layer etching of gallium nitride (0001)

Christoffer Kauppinena, Sabbir Ahmed Khanc, Jonas Sundqvist, Dmitry B. Suyatin, Sami Suihkonen, Esko I. Kauppinen, and Markku Sopanen

Plasmalab 100 ALE

Discretes (GaN PE/RF)

February 2015 

Design and fabrication of suspended indium phosphide waveguides for MEMS-actuated optical buffering

Ng Wing H., Podoliak Nina, Horak Peter, Wu Jiang, Liu Huiyun, Stewart William J. and Kenyon Anthony J.

PlasmaPro 100 RIE

Optoelectronics 

December 2010

Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films

K. B. Jinesh, J. L. van Hemmen, M. C. M. van de Sanden, F. Roozeboom, J. H. Klootwijk, W. F. A. Besling, and W. M. M. Kessels

FlexAL ALD

Semiconductor, Quantum

February 2008

Fabrication of 22 nm T-gates for HEMT applications

S. Bentley, X. Li, D.A.J. Moran, I.G. Thayne

PlasmaPro 100 RIE

RF Devices

October 2006

Low-Hydrogen-Content Silicon Nitride Deposited at Room Temperature by Inductively Coupled Plasma Deposition

Haiping Zhou, Khaled Elgaid, Chris Wilkinson and Iain Thayne

PlasmaPro 100 ICPCVD

RF Devices

Our Customers' Published Research

Creation of regular arrays of faceted AlN nanostructures via a combined top-down, bottom-up approach - R.Armstrong, P-M.Coulon, P.Bozinakis, R.W.Martin, P.A.Shields

High Power Si Sidewall Heaters for Fluidic Applications Fabricated by Trench-Assisted Surface Channel Technology - H. Veltkamp, Y. Zhao, M. J. de Boer, R. G. P. Sanders, R. J. Wiegerink and J. C. Lötters

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 - Karsten Arts, Harvey Thepass, Marcel A. Verheijen, Riikka L. Puurunen, Wilhelmus M. M. Kessels, Harm C. M. Knoops