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PECVD Systems

The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate.

Products

The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical…

PlasmaPro 100 PECVD

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The PlasmaPro 800 offers a flexible solution for reactive ion etching (RIE) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading system. The large…

PlasmaPro 800 PECVD

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The PlasmaPro 80 is a compact, small footprint system offering versatile etch and deposition solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 PECVD

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Maximised large area etching and deposition production solutions

PlasmaPro 1000

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