Part of the Oxford Instruments Group
Expand
Oxford Instruments
Applications
Products
News
Events
Contact
SustainabilityInvestorsCareersNewsEventsContact
Investors Careers
About Us
Our FacilityNewsEventsSolutions for ProductionSolutions for ResearchSustainability
Applications
2D MaterialsAugmented RealityBiomedical DevicesFailure AnalysisHBLEDs
MEMS & SensorsInfrared SensorsLasersMicro-LEDs
Power DevicesQuantum TechnologyRF DevicesVCSELs
Technologies
Plasma EtchingReactive Ion EtchingRIE-PEICP RIE EtchingDeep Reactive Ion Etching
Ion Beam
Ion Beam DepositionIon Beam Etching
Plasma deposition
PECVDICPCVDCVD
Atomic scale
Atomic Layer DepositionAtomic Layer EtchingAtomic Scale Processing
Materials & ProcessesSiCSiO2Al2O3CrAlGaN/GaNBrowse more...
Products
ICP RIE EtchPlasmaPro 80 ICPPlasmaPro 100 Cobra ICPPlasmaPro 100 Polaris ICPRIEPlasmaPro 80 RIEPlasmaPro 100 RIEPlasmaPro 800 RIE
Deep Si Etch
PlasmaPro 100 Estrelas DSiE
PECVDPlasmaPro 80 PECVDPlasmaPro 100 PECVDPlasmaPro 800 PECVDICPCVDPlasmaPro 80 ICPCVDPlasmaPro 100 ICPCVDCVDPlasmaPro 100 Nano CVD
ALDAtomfab ALDFlexAL ALD
ALE
PlasmaPro 100 ALE
Ion Beam
Ionfab IBEIonfab IBD
Software
PTIQ Software
Colour Centres Quantum White Paper - Oxford Instruments
Library
BlogProcess NewsVideosWebinarsWhite PapersCustomer GalleryCustomers' Publication
Support
Service & Support
Service AgreementsUpgrades & SoftwarePTIQ SoftwareSparesTeamviewer
Training CoursesBasic Training CoursesIntermediate Level CoursesAdvanced Level CoursesStandalone Training Modules
Raise a Support Ticket
Contact Us
Oxford Instruments - TSIA STAR Awards Finalist
Contact Us
Shop
UKEuropeUS & CanadaAsiaJapan
News
Events
Contact
eCommerce
  1. Home
  2. Products
  3. PECVD

PECVD Systems

The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical characteristics and wet chemical etch rate.

Products

The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of film properties such as refractive index, stress, electrical…

PlasmaPro 100 PECVD

Find out more

The PlasmaPro 800 offers a flexible solution for Plasma Enhanced Chemical Vapour Deposition (PECVD) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading…

PlasmaPro 800 PECVD

Find out more

The PlasmaPro 80 is a compact, small footprint system offering versatile etch and deposition solutions with convenient open loading. It is easy to site and easy to use, with no compromise…

PlasmaPro 80 PECVD

Find out more

© Oxford Instruments 2021

Website by Miramar Communications Ltd