Oxford Instruments partners with Hakuto to expand advanced plasma…
Oxford Instruments is pleased to announce the appointment of Hakuto Co.,…
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With systems designed for high volume manufacturing (HVM) or research and development we deliver the hardware and process solutions you need for your Lab or Fab. Our plasma processing technology offers a wide range of advanced capabilities for etching, deposition and material growth. With over 8,000 recipes in our library, we provide process development and support, customised to our customers' needs, enabling them to achieve the right cost of ownership with high wafer yield and fast, high-performance processing.
Plasma process is essential for manufacturing of advanced microelectronics. Our plasma processes provide the reliability to confidently achieve the desired device characteristics. Our versatile plasma etching and deposition tools deliver:
Ion beam etch and ion beam deposition offers film quality and etch control coupled with excellent uniformity. It is ideal for a wide range of applications such as MRAM, laser bar facets and thin film magnetic heads. Ion beam technology enables researchers and high volume manufacturers to produce dense, high quality films with smooth surfaces.
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
PTIQ is the latest intelligent software solution for PlasmaPro and Ionfab processing equipment.
At Oxford Instruments Plasma Technology, we offer a wide range of technical training courses designed to suit all skill levels and needs.
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