PTIQ is the latest intelligent software solution for Plasma Technology systems. It provides an exceptional level of system control with powerful scheduling and insightful reporting tools, that unlock new possibilities for improved processing efficiency and dynamic workflows. PTIQ Software optimises system and process performance in the Lab and Fab, with different levels of software available to suit facility requirements.
NOTE: We are experiencing a bug issue with the PTIQ software. This issue is limited to a very specific type of recipe editing, so most customers will not encounter the issue. Please click here to help you debug the issue.
WATCH DEMOPTIQ Screen Layout
A software module that connects the Oxford equipment over a SECS/GEM link to a factory host controller for use in an automated
semiconductor fab.
PTIQ AnalytIQs is a set of analytical tools to maximise the uptime of the system, to allow deeper understanding and interpretation of process logged data through the statistical analysis of data. They further extend the PTIQ LogViewer for the tracking and analysis of all system parameters.
DOWNLOAD BROCHUREPremium module to measure, analyse and report on the data captured whilst processing.
A set of engineer analysis tools that are essential for self-maintained systems and troubleshooting drills down to the heart of the electronics to control the equipment. These are the same tools available to Oxford Instruments customer support engineers.
This premium module is responsible for periodic backup of recipes, configuration and process run data to a remote computer.
This can be for archival purposes or to transpose the data ready for external processing as required.
If you currently run a system with PC2000 or PC4500, and want to upgrade to PTIQ, we have several upgrade paths available. On completion of the upgrade, you will automatically enrolled in the Oxford Instruments Software Assurance Agreement.
We also have site-wide PTIQ Upgrade plans; you can upgrade your whole site for a discounted rate to ensure continuity of software support going forward.
We are experiencing a bug issue that has been identified with the PTIQ control software. The issue affects all versions of PTIQ up to and including 2021.13.02. This issue is limited to a very specific type of recipe editing (using sub-steps within a recipe step) so most customers will not encounter the issue. Please click here to help you debug the issue.
When is this available?
PTIQ is available now.
Since February 2020, systems have been quoted, are being built, and leaving the factory with PTIQ. At present, around 75% of our product line is utilising PTIQ, meaning PlasmaPro 100, 80, and 800 are currently set up for the new software. Our new ATOMFAB system also includes PTIQ.
Before the end of the year, it will be made available on our Ionfab, Estrelas and Polaris systems.
If I have an etch system and a deposition system, will it be the same software and work the same way?
Yes. This was an important goal for the new software to give a consistent look and feel and to find the common actions needed to operate all our systems.
There will be a few notable differences, but they relate to the specific technologies involved. This means that, whether the modules exist on the same cluster configuration or are side by side as two separate single module tools, the software will be the exact same.
Does this work with cluster systems?
We support our three families of products with PTIQ: open-load, single module and our cluster systems. All three types of system have the same look and feel and operate in a similar manner.
Is PTIQ touch screen compatible?
We have designed the software with the view that it will be controlled via a touchscreen, ensuring that with a 24” touchscreen that the active areas will be at least 1cm square. Although the SEMI E95 standard is no longer active, it does still serve a purpose in helping to make a touchscreen operator interface for Semiconductor Capital Equipment.
Is PTIQ multi-monitor compatible?
This is on our short-term roadmap. We built the software from the ground up with dual monitor support from the beginning, but this is not yet available to be activated in the software as this feature needs a little more work before it is complete.
Can a parameter (e.g. RF) be graded from start and end value through a loop?
This feature is in the process of being developed as we seak to support the more advanced deep silicon etch processes. Our implementation will be available for all process modules when it is released, not only the Estrelas tool.
Do you have a simulator of this software that we can install in our personal computer for testing or training?
We have a simulator/emulator that can be used for this purpose. For example, it does a very good job of emulating the hardware including some simple algorithms to emulate the physics involved in pressure control.