Inductively Coupled Plasma Etching (ICP)

ICP etching is a widely used technique to deliver high etch rates, high selectivity and low damage processing. Excellent profile control is also provided as the plasma can be maintained at low pressures.

The Cobra^® ICP etcher sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

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Diagram of ICP etching system technology

Highlights

High etch rates
Excellent uniformity
High density of reactive species at low pressure
Excellent substrate DC bias control
Excellent ion energy control
Wide temperature range electrode from -150ºC to +400ºC

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Features & Benefits
Hardware

High etch rates are achieved by high ion density (>10¹¹ cm³) and high radical density
Control over selectivity and damage is achieved by low ion energy
Separate RF and ICP generators provide separate control over ion energy and ion density, enabling high process flexibility
Low pressure processing yet still high density for improved profile control
Chemical and ion-induced etching
Can also be run in RIE mode for certain low etch rate applications

Can be used for deposition in ICP-CVD mode
High conductance pumping port provides high gas throughput for fastest etch rates
Electrostatic shield eliminates capacitive coupling, reduces electrical damage to devices, reduces chamber particles
Wafer clamping and helium cooling as standard, providing excellent temperature control with the option of a wide temperature range

	PlasmaPro 80	PlasmaPro 100	PlasmaPro Estrelas	PlasmaPro Polaris
Electrode size	240mm
Loading	Open load	Load lock or Cassette
Wafer size	Up to 50mm (2")*	Up to 200mm
MFC controlled gas lines	8 or 12 line gas box available		3-5 close coupled gas lines with options for 8-12 external	8 or 12 line gas box available
Wafer stage temperature range	-150 to 400ºC

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ICP Etching Systems

Website by Miramar Communications Ltd

Inductively Coupled Plasma Etching (ICP)

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Dry etching of high power VCSEL array

Devices fabrication for biomedical applications

InP laser diode device production

Highlights

ICP Etching Systems