Part of the Oxford Instruments Group
Expand

PlasmaPro 100 Polaris

An evolution in single wafer etch technology.

With extensive experience of etching materials such as GaN, SiC and Sapphire, our technologies enable the cost of ownership and yield required to maximise the performance of your devices.

The PlasmaPro 100 Polaris single wafer etch system offers smart solutions to produce the superb etch results you need to maintain your competitive edge.

  • Superb etch rates
  • Low cost of ownership
  • Designed specifically for harsh chemistries
  • Excellent etch uniformity
  • Exclusive electrostatic clamp technology capable of clamping sapphire,
  • GaN on sapphire and silicon
  • High conductance pumping system
  • Clusterable with other PlasmaPro systems


Request Pricing Add to quote list

The PlasmaPro 100 Polaris single wafer etch system offers smart solutions to produce the etch results you need to maintain your competitive edge.

Designed specifically for the harsh chemistries required for etching tough materials such as GaN, Sapphire and SiC, the PlasmaPro 100 Polaris delivers fast etch rates uniformly on wafers up to 200mm diameter.

Actively cooled electrode - Maintains sample temperature during etch process

High power ICP source - Produces high density plasmas

Reliable hardware and ease of serviceability - Excellent uptime

Magnetic spacer - Enhanced ion control and uniformity

Exclusive electrostatic clamp technology - Capable of clamping sapphire, GaN on sapphire and silicon

Heated chamber liners - Optimised to reduce chamber wall deposition

Advanced auto matching unit (AMU) - Allows fast, efficient and accurate matching, enabling excellent process repeatability

  • RF device SiC Via hole etch
  • Power Semiconductor Device SiC feature etch
  • HBLED GaN etch
  • RF device GaN etch
  • Patterned Sapphire Substrate (PSS) Etch
  • SiO2 and quartz etch
DOWNLOAD BROCHURE

Global Customer Support

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

  • Remote diagnostics software provides quick and easy fault diagnosis and resolution.
  • Support contracts are available to suit the budget and situation.
  • Global spares in strategic locations for quick response.
FIND OUT MORE

NEW: PTIQ Software

PTIQ is the latest intelligent software solution for PlasmaPro and Ionfab processing equipment.

  • Exceptional level of responsive system control
  • Optimise system and process performance
  • Different levels of software to suit your requirements
  • Brand new intuitive layout and design
FIND OUT MORE

Related Applications

FabricationQuantum Information ProcessingFabrication and Characterisation of Light Emitting DevicesBioMEMS Fabrication

Latest news