Part of the Oxford Instruments Group
Expand
Oxford Instruments
Applications
Products
News
Events
Contact
Sustainability Investors Careers News Events Contact
Investors Careers
  1. Home
  2. Technologies
  3. CVD

Chemical Vapour Deposition (CVD)

CVD is a well-established technique for deposition of a wide variety of films with different compositions and thicknesses down to a single layer of atoms.

In-depth diagram of CVD system chamber

Blogs

Why ALD & 2D Materials Are a Great Match
Solutions for Graphene & 2D Materials Devices

Webinars

Graphene & 2D Materials
2D Materials Beyond Graphene

Highlights

  • Substrate sits directly on electrode which can be heated up to 1200˚C
  • Gas injected into process chamber via “showerhead” gas inlet in the top electrode
  • Solid/liquid precursor delivery system for novel processes such as 2D materials MOCVD, ZnO nanowire CVD etc.
  • Automatic load lock to transfer sample directly on to a hot table and save time on heating and cooling.
  • Plasma enhancement options for lower temperature deposition or plasma assisted conversion or functionalization as well as chamber cleaning.
  • Wide range of processes possible in the same chamber
  • PlasmaPro® 100 Nano is a high temperature CVD/PECVD system tailored for high quality deposition of nanostructured materials and Silicon based thin films.
Request More Information Download Brochure
  • Up to 1200˚C table temperature
  • Direct and remote plasma enhancement options
  • Operating pressures up to 5 Torr (higher possible)
  • Dry plasma cleaning process with end-point control removes or reduces need for physical/chemical chamber cleaning 
  • Multiple heated/cooled liquid/solid precursors delivery system in addition to 12 gas delivery lines.
  • Offers a wide range of material deposition, including:
    • Si based PECVD/ICP CVD processes and high temperature CVD processes in the same chamber
    • 1D materials growth such as Carbon nanotubes, ZnO nanowires and Si Nanowires
    • 2D materials growth  such as Graphene, hBN, MoS2/WS2 and other transition metal dichalcogenides (TMDCs)
Image of CVD process in operation, remote plasma
Graphene domains on Copper foil. (Growth arrested before film completion to visualise domains in SEM)

Graphene domains on Copper foil
CVD Growth of hBN

hBN CVD
CVD Growth of MoS2

MoS2 CVD
More 2D materials...
PlasmaPro 100 Nano
 700°C table 800°C table 1200°C table
Thin Film Process SiOx, SiNx, aSiC, aSi, μc-Si, polySi* SiOx, SiNx, aSiC, aSi, μc-Si, polySi SiOx, SiNx, aSiC, aSi, μc-Si, polySi
1D Nano materials MWNTs, Si, Ge NWs, ZnO NWs MWNTs, SWNTs, Si, Ge, ZnO NWs MWNTs, SWNTs, Si, Ge, ZnO NWs
2D Nano materials NA NCG, Vertical Graphene NCG, Vertical Graphene, BN, MoS<sub>2</sub> CVD Graphene
Download Brochure
Request Quote for Nano CVD

CVD Systems

PlasmaPro 100 Nano CVD

Related Content

WEBINAR
Pioneering 2D Materials for Semiconductor Industry
Watch Now >
Joint Symposium
Fabrication and Characterization of Quantum Devices

Watch Now >
WEBINAR
Fabrication Processes for High Quality Quantum Devices
Watch Now >
WEBINAR
Growth and Characterization of 2D Materials for Electronic Applications
Watch Now >

© Oxford Instruments 2025

Website by Miramar Communications Ltd