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Solutions for Graphene & 2D Materials Devices

13 June 2019  |  Dr Ravi Sundaram

Exploring Solutions for Graphene and 2D Materials Devices

It has been almost 15 years since the seminal experiments on uncovering the fascinating properties of graphene. What started as a playground for fundamental physics studies has now evolved into a healthy wave of development activities to harness the superlative properties of this fascinating class of atom-thick materials.

In particular, applications in integrated photonics, light-emitting devices and new channel materials for more-than-Moore technologies are showing promising value propositions over incumbent solutions.


Recently, we organized a webinar highlighting some of the key technologies necessary to drive graphene-based (and 2D materials) devices to the next stage of technology readiness.

In order to address the challenges faced by the community working on this technology, we partnered with Raith Gmbh and das-Nano S.L. The idea behind this event was to provide an overview of solutions not restricted to Oxford Instruments Plasma Technology’s expertise on atomic layer growth, etching and dielectric deposition but also highlight challenges and solutions in two other critical processes which are lithography and non-destructive electronic quality characterization.



We kicked off the webinar presenting the latest updates in our Graphene device processing solutions. Highlights were the excellent progress made towards processes wafer-scale integration of graphene and other 2D materials such as MoS2, atomic layer deposition of high-quality dielectrics on these inert surfaces and atomic layer etching of 2D materials.


Dr Frank Nouvertne from Raith Gmbh – who are well-known leaders in electron beam lithography solutions – presented some of the challenges and solutions of preparing graphene devices. In particular, the new optical imaging modules offered for minimizing graphene contamination that could be an issue while locating and imaging using electron beams as well as the ease of use that allows efficiently revisiting the area of interest when doing multiple layers of lithography was impressive to see.


Finally, Dr Israel Arnedo from das-Nano S.L. introduced and highlighted a wonderful new technique to quickly and non-destructively use ThZ time domain spectroscopy in reflection mode to ascertain electrical figures of merit of graphene and other thin films. das-Nano is a technology company that provides state-of-the-art solutions for many industries such as aerospace, automobile, wind and naval. It was great to learn about the power of this technique that with a single scan across even a 300 mm wafer can provide map of conductivity/sheet resistance, drift mobility, carrier density and much more.


In case you missed all this action and are keen to learn details about these technologies, the good news is that we have created an on-demand link for you all to view this at your convenience! We encourage you to avail of this service and get in touch with us with your questions, suggestions to improve or even if you wish to discuss anything that we have presented in detail. Looking forward to hearing from you!

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