The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition (ALD) processes and thermal ALD within a single ALD system.
The ALD product family encompasses a range of tools to meet the varied demands of academia, corporate R&D and small scale production.
Oxford Instruments has an extensive process library, and new processes are continually being developed. We provide free on-going process support for the lifetime of any ALD tool, offering advice on developing new materials and continued access to our latest ALD process developments including new process recipes.
Integral glove box on precursor modules - In-situ change-over
Integral ports - Allow the addition of in-situ ellipsometry measurement tools
Clusterable - Vacuum transfer of substrates
Cassette to cassette handling - Increases throughput suitable for production
Robotic handler and cassette - Handles 100mm, 150mm or 200mm wafers (no tools required to swap between wafers)
All configurations can be located entirely within the cleanroom or through-the-wall - Easy to site
Automated 200mm load lock - Process flexibility
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
The FlexAL2D system provides ALD of 2D transition metal dichalcogenides (TMDCs) for nanodevice applications and offers a number of benefits for growth of 2D materials
2D materials growth
Robust ALD processes for 2D materials
Gas pod - incorporate extra gas lines and allow greater flexibility
Logviewer software - datalogging software allows realtime graphing and post run analysis
Optical end point detectors - an important tool for achieving optimal process results
Turbomolecular vacuum pump - offers superior pumping speeds and higher throughput
X20 Control System - delivers a future proof, flexible and reliable tool with increased system ‘intellect’
Dual CM gauge switching - provides the ability to utilise two differing ranges of capacitance manometer via a single pressure control valve
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