A 200-850 nm system and software integrated spectrometer is available as an upgrade option for all PlasmaPro 100 PECVD systems, regardless of deposition rate. The new product upgrade benefits from dual functionality, with reflectometer endpoint monitoring of film thickness during the process by capturing the optical emission, in addition to plasma chamber clean endpointing between processes. The intensities of up to 3 wavelengths can be data logged and full spectrum data can be viewed and recorded using the software.
Note: this upgrade is not compatible with high or low frequency pulsed plasmas as the system requires constant plasma generation frequency and power.