This controller ensures very fast and accurate pressure control. The system parameters are set up automatically within the tool on first startup after the upgrade has been fitted. The adaptive algorithm the controller continuously adapts to the process conditions (species of gas, gas flow) and thus ensures optimum pressure control at any time.
The APC is used to restrict pumping during the dose step for a precursor. Often long exposure times are needed for slow-to-react precursors, or when deposition into high aspect ratio features is required.Request Pricing