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Webinar
How To Plasma Etch Silicon Carbide (SiC) To Achieve Maximum Device Performance

7 May 2020 at 3PM (UK)


About the Webinar

Silicon Carbide (SiC) is becoming well established within power device manufacturers as it offers compelling advantages vs Si in several applications.

Manufacturing SiC devices require expert knowledge of plasma processing techniques in order to maximise device performance, watch this webinar to discover more about these techniques.

In this webinar, you will learn:

  • How to achieve precision features on SiC surfaces
  • Fast and efficient plasma etching techniques to achieve deep SiC vias
SiC etch
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Meet the Presenter

Dr Mark Dineen

Dr Mark Dineen
Technical Marketing Manager, Oxford Instruments

Dr Mark Dineen has over 20 Years of plasma processing experience. His more recent work includes applying this knowledge to a wide range of devices from semiconductor lasers to GaN-based RF devices.

He is now an experienced Technical Marketing Manager with a demonstrated history of communicating complex technical ideas and scientific concepts to a varied audience. These technologies include ALD, ALE, CVD, ICP, PECVD and RIE plasma processing and he covers how these can deliver device solutions to our customers.

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