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Inductively Coupled Plasma Etching (ICP)

ICP etching is a widely used technique to deliver high etch rates, high selectivity and low damage processing. Excellent profile control is also provided as the plasma can be maintained at low pressures. The Cobra® ICP etching sources produce a high density of reactive species at low pressure. Substrate DC bias is independently controlled by an RF generator, allowing control of ion energy according to process requirements.

ICP Etching Diagram

Highlights

  • High etch rates
  • Excellent uniformity
  • High density of reactive species at low pressure
  • Excellent substrate DC bias control
  • Excellent ion energy control
  • Wide temperature range electrode from -150ºC to +400ºC
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  • High etch rates are achieved by high ion density (>1011 cm3) and high radical density
  • Control over selectivity and damage is achieved by low ion energy
  • Separate RF and ICP generators provide separate control over ion energy and ion density, enabling high process flexibility
  • Low pressure processing yet still high density for improved profile control
  • Chemical and ion-induced etching
  • Can also be run in RIE mode for certain low etch rate applications
  • Can be used for deposition in ICP-CVD mode
  • High conductance pumping port provides high gas throughput for fastest etch rates
  • Electrostatic shield eliminates capacitive coupling, reduces electrical damage to devices, reduces chamber particles
  • Wafer clamping and helium cooling as standard, providing excellent temperature control with the option of a wide temperature range

PlasmaPro 80
PlasmaPro 100 PlasmaPro Estrelas PlasmaPro Polaris
Electrode size 240mm
Loading Open load
Load lock or Cassette
Wafer size Up to 50mm (2")* Up to 200mm
MFC controlled gas lines 8 or 12 line gas box available 3-5 close coupled gas lines with options for 8-12 external 8 or 12 line gas box available
Wafer stage temperature range -150 to 400ÂșC
Download PlasmaPro 80 Brochure
Download PlasmaPro 100 brochure
Download Estrelas brochure
Download Polaris brochure

ICP Etching Systems