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Powerful Ion Beam Etching Processing Solutions

Discover our industry-leading IBE solutions and systems, enabling a wide range of applications.

Ion Beam Etching (IBE) Solutions

Ion beam technology provides an exceptionally versatile approach to etching by offering a single tool and maximising system utilisation. Ion beam etch offers maximum flexibility coupled with excellent uniformity.

Ion Beam Etching (or milling) is achieved by directing a beam of charged particles (ions) at a substrate with a suitably patterned mask in a high vacuum chamber. It enables highly-directional beams of neutral ions to control over the sidewall profile as well as radial uniformity optimisation and feature shaping during nanopatterning.

Tilted features can be created by the unique ability to tilt the sample altering the direction of impact of the ion beam.

Our ion beam system, Ionfab, can be configured for etching (IBE) as well as deposition (IBD) technologies.

Key Benefits of IBE

  • Allows beam energy and ion flux to be independently controlled
  • Process takes place in a low-pressure working environment
  • Produces anisotropic etching
  • Provides means for all known materials to be etched
  • Allows angled profile control thanks to a variable etch beam angle relative to sample/mask surface

 

CAIBE GaAs SEM

CAIBE GaAs using a
hard mask.

Slanted grating SEM

SiO2 slated gratings for AR applications.

Applications

  • Slanted etching
  • Laser facet etching
  • Magnetoresistive random access memory (MRAM)
  • Dielectric films
  • III-V photonics etching
  • Spintronics
  • Metal contact and track
  • Superconductors

 

Processes

Available processes
Metals Au, Ag, Pt, Cu, Al
Magnetics/Alloys MnIr, CoFe, FeMn, NiCr
Refractory oxides MgO, SiO<sub>2</sub>
III-Vs InGaAsP, InSb, GaN, GaAs, InP
II-VIs cDtE, cDhGtE, zNo, zNsE
Composites  and others SrTiO<sub>3</sub>, LaAlO<sub>3</sub>, LiNbO<sub>3</sub>, Si
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Ionfab IBE System

Our ion beam etch (IBE) system is a popular choice for high-quality material processing. Our systems have flexible hardware options including single substrate load lock and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.

  • Multiple mode functionality
  • Capable of clustering with other plasma etch and deposition tools
  • Dual-beam configuration
  • Very low surface film roughness
  • Flexible configuration for advanced research applications
  • Unmatched uniformity and process reproducibility for production
  • Flexible wafer handling capacity - single wafer load lock or cassette-to-cassette robotic handler

View full hardware specification >

Ion Beam Deposition (IBD) Solutions

As well as our IBE technology, we also offer ion beam deposition (IBD) solutions.

Ion Beam Deposition is a versatile and flexible thin film deposition technique that offers reliable, high quality and high-performance coatings, finding applications notably in infrared devices and high power lasers.

Our Ionfab Ion Beam system is capable of both IBE and IBD technology.

IBD Applications

  • Laser facet coating (including high and anti-reflection)
  • Ring laser gyroscope mirrors
  • X-ray optics
  • II-VI-based infrared (IR) sensors
  • IR sensors (Vanadium oxide, II-VI)
  • Telecom filters

Applications for Ion Beam Etching


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