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Powerful Ion Beam Deposition Processing Solutions

Discover our industry-leading IBD solutions and systems, enabling applications from IR sensors to datacomms.

Ion Beam Etching (IBD) Solutions

Ion Beam Deposition (IBD) provides an exceptionally versatile approach to deposition. Our ion beam deposition products are chosen for their ability to produce deposited films with high quality, dense and smooth surfaces.

Our systems have flexible hardware options including open load and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.

System specifications are closely tuned to applications, enabling faster and repeatable process results. Properties, such as refractive index, absorption, scattering, adhesion and packing density, can be tuned by varying beam parameters such as beam flux and energy, platen orientation relative to incoming materials and gas flow.

IBD image or diagram

Key Benefits of IBD

  • High-quality thin films with ultra-low contamination
  • High throughput with reduced footprint for low cost of operation
  • Unmatched batch uniformity and process reproducibility
  • Very accurate optical film thickness control
  • Very low surface film roughness

 

IBD Applications

  • Laser facet coating (including high and anti-reflection)
  • Ring laser gyroscope mirrors
  • X-ray optics
  • II-VI-based infrared (IR) sensors
  • IR sensors (Vanadium oxide, II-VI)
  • Telecom filters
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Ionfab IBD System

Our ion beam deposition (IBD) system is a popular choice for high-quality material processing. Our systems have flexible hardware options including single substrate load lock and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.

  • Multiple mode functionality
  • Capable of clustering with other plasma etch and deposition tools
  • Dual-beam configuration
  • Very low surface film roughness
  • Flexible configuration for advanced research applications
  • Unmatched uniformity and process reproducibility for production
  • Flexible wafer handling capacity - single wafer load lock or cassette-to-cassette robotic handler

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Ion Beam Deposition (IBE) Solutions

As well as our IBD technology, we also offer ion beam etching (IBE) solutions.

Ion Beam Etching (or milling) is achieved by directing a beam of charged particles (ions) at a substrate with a suitably patterned mask in a high vacuum chamber. It enables highly-directional beams of neutral ions to control over the sidewall profile as well as radial uniformity optimisation and feature shaping during nanopatterning.

Our Ionfab Ion Beam system is capable of both IBE and IBD technology.

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IBE Applications

  • Slanted etching
  • Laser facet etching
  • Magnetoresistive random access memory (MRAM)
  • Dielectric films
  • III-V photonics etching
  • Spintronics
  • Metal contact and track
  • Superconductors

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