The need for forming slanted gratings for applications such as combiners for AR headsets has seen a recent surge. Ion beam etching technology is one of the best-suited techniques to enable the grating design required for these applications. Ion beam directionality in conjunction with variable incident beam angle via platen angle setting enables profile control and feature shaping during nanopatterning.

Ion beam expertise is critical to deliver the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to build high quality gratings for masters. Our solution delivers a large uniform processing area over 200 mm wafers for angles from 0° to 55°. In this paper, we share our experience in tuning the process for excellent shape control...