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Diamond-based Quantum Systems: NV Centres

Discover our expertise in plasma etching solutions for the fabrication of diamond-based quantum devices.

Plasma-enhanced Etching Solutions for Quantum

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We offer two quantum diamond fabrication solutions:

  • Plasma Etching of Diamond Surfaces & Features
  • Plasma Etching to Create Surfaces for Efficient Light Collection
  • SiNx hard mask deposition, e.g. Si3N4
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Plasma Etching of Diamond with NV Centres

Fabrication of thin diamond membranes or surface etch for efficient probing of buried NV Centres

A 3-step RIE process to bring the NV centres closer to the surface while providing additional protection via O-termination, thereby enabling improved manipulation or storing of quantum information.

1) Isotropic particle removal

2) Diamond bulk etch with precise stop within a few um from the NV centres

3) Oxygen termination of the surface to improve stability of NV centres

Surface characteristics:

  • Smooth surface Ra < 0.3 nm
  • Low damage/contamination
  • Possibility of shaping/micro lens creation on surface
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Image showing SEMS with pre-etch Image showing SEMS with pre-etch

3-step RIE process to create a defect-free, smooth, O-terminated diamond surface.

Plasma Etching for Creating Efficient Light Coupling Components

Photonic crystals and cavities help efficiently extract signals from Diamond

Photonic crystals, nanocavities and waveguides coupled to quantum emitters, to improve photon generation, increase light extraction and allow for long-distance transport of quantum information.

Optomechanical microdisk resonators to enhance spin-photon coupling, enable greater manipulation of quantum information and offer an interface to various quantum platforms.

  • PECVD of Si3N4 to use as a hard mask deposition
  • ICP RIE of Si3N4 hard mask (CF4/SF6) to pattern the mask
  • Isotropic ICP RIE of diamond
  • Passivation with plasma ALD Al2O3
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Photonic crystals large SEM

Photonic crystals in Diamond
(Credit: S. Bogdanovic, TU Delft)

Systems for Diamond Quantum Applications

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Enabling these solutions are the FlexAL and PlasmaPro 100 deposition and etch systems, capable of producing small coupons through to 200 mm wafers, clusterable to increase throughput and avoid vacuum breaks.

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Developed in partnership with leading institutions and companies.

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More Quantum Technology Solutions

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