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Chemical Vapour Deposition (CVD) & PECVD tools for growth of 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) delivers high-performance growth of nanomaterials with in-situ catalyst activation and rigorous process control, with flexible temperatures up to 1,200°C.
Excellent uniformity with flexible temperatures up to 1200°C
Sample sizes up to 200mm
Vacuum load lock - Quick sample exchange
Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs
Excellent uniformity with flexible temperatures up to 1200°C
Sample sizes up to 200mm
Vacuum load lock - Quick sample exchange
Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
PTIQ is the latest intelligent software solution for PlasmaPro and Ionfab processing equipment.
Gas pod - incorporate extra gas lines and allow greater flexibility
Turbomolecular vacuum pump - offers superior pumping speeds and higher throughput
Optical end point detectors - an important tool for achieving optimal process results
TEOS liquid level sensing - level sensing is achieved using ultra sonic level sensors fitted to the TEOS canister
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