This webinar provides an overview of wafer-scale device fabrication and characterization technologies that would drive the development of graphene and 2D materials based technology to the next stage of technology readiness.
Three aspects of graphene/2D device development work will be covered:
On Demand
On Demand
Duration:1 hour 10 minutes
Language:English
Businesses:Plasma Technology
Time (BST) |
Talk Title |
Presenter |
15:00-15:20 |
Wafer Scale Device Fabrication Technology for Graphene & 2D Materials |
Ravi Sundaram |
15:20-15:40 |
Wafer Scale Nanofabrication of Graphene-based Devices by EBL |
Frank Nouvertne |
15:40-16:00 |
THz Based Non-Contact Mobility, Conductivity Measurements on Wafer Scale |
Israel Arnedo |
Vapour deposition techniques have become the workhorse for all device fabrication based on graphene and other 2D materials. For successful scaling up of prototypical applications demonstrated to date, technologies and processes for large area deposition of these materials need to be developed.
In this talk I will first give an overview of lab to fab technologies and processes developed at Oxford Instruments towards growth of Graphene, other layered materials and heterostructures by CVD and ALD followed by our developments in technology for device fabrication processes such as dielectric deposition by ALD and device pattern etching by RIE and ALE.
Electron beam lithography (EBL) systems have proven to be flexible nanofabrication tools enabling a broad range of nanotechnology applications. They are regarded as a “must have” in today’s nano R&D-based laboratories of various disciplines. These EBL techniques routinely provide nanopatterning resolution with sub 10nm feature sizes.
The fundamentals of electron beam lithography and related subsequent essential process technology steps for nanodevice fabrication will be described. Emphasis will be given on a number of various applications, showing both fundamental graphene research & advanced (waferscale) graphene nanodevice applications.
In this talk, I will explain how the combination of the particular features of THz waves introduces a new way of seeing what was not visible before. This technology has been implemented in ONYX, the first system in the market designed to provide a full-area non-destructive characterization of graphene, thin-films, and other 2D materials covering the gap between the macro and the nanoscale tools.
Its principle of operation, main features and possible applications will be detailed. Big industry players and research institutions are already using our terahertz-based devices, such as Onyx, implementing it in their manufacturing processes and quality control.
Dr Ravi Sundaram is the Head of strategic R&D Markets at Oxford Instruments Plasma Technology responsible for leading the marke...
Frank Nouvertné received his PhD in Physics in 1998 at Technical University in Aachen and subsequently worked as a postdoc for...
Israel Arnedo is currently the Terahertz Technology Director at das-Nano S.L company and Associate Professor with the Electrica...
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