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  3. PlasmaPro 100 Cobra ICP

PRODUCT NAME

<Brief summary of product using a couple of sentences. Atomfab delivers fast, low damage, low CoO production plasma ALD processing for GaN power and RF devices.>

KEY FEATURES:

  • Key feature   1
  • Key feature 2
  • Key feature 3
  • Key feature 4
  • Key feature 5

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OVERVIEW

This is a detailed overview about the system talking about its key features.

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APPLICATIONS

  • Application 1
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FEATURES & BENEFITS
COMPARE SYSTEMS
  • Guaranteed processes setup by our engineers
  • Lifetime process support for additional/new processes
  • Low-damage plasma processing
  • High quality deposition with low film contamination
  • Low particle levels
  • Short plasma exposure times enabling high throughput
  • Plasma surface pre-treatments

Image/SEM 1 caption

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Etch Rate Temperature Uniformity Feature X Feature Y
PlasmaPro 100 X X X X
PlasmaPro 80 X X X X
VIEW ALL PECVD SYSTEMS
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GLOBAL CUSTOMER SUPPORT

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

  • Remote diagnostics software provides quick and easy fault diagnosis and resolution.
  • Support contracts are available to suit the budget and situation.
  • Global spares in strategic locations for quick response.

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UPGRADES & ACCESSORIES

We offer a range of system upgrades that both extend the life of your system and add new functionality.

RELATED CONTENT

WHITE PAPERS

ALD FOR GaN POWER DEVICES

In this white paper, we explore some key features of ALD for GaN power devices.
READ NOW >

WEBINARS

ALD FOR GaN POWER DEVICES

In this webinar, we explore some key features of ALD for GaN power devices.
WATCH NOW >
CONTACT US
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RELATED PRODUCTS

Atomfab ALD
PlasmaPro 80 ICP RIE
PlasmaPro 100 RIE
1000 Series Glass X-ray Tube
PlasmaPro 800 RIE

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