Products

Product Groups (None Selected)

ALD

ALD

Excellent process control
Superb thin film barrier properties
Virtually pin-hole free films

ALE

ALE

High selectivity
Low damage
Excellent uniformity

PlasmaPro 100 ALE and Etchpoint

PlasmaPro 100 ALE and Etchpoint

DSiE

DSiE

Precision etch processes
High selectivity
High aspect ratio

Ion Beam Systems

Ion Beam Systems

Multiple wafer handling options
Multiple mode functionality
Single wafer loadlock or cluster wafer handling

ICP Etching Systems

ICP Etching Systems

High density
Low pressure
Wide temperature range

ICPCVD

ICPCVD

Excellent quality
Low damage films
Wide temperature range

CVD Systems

CVD Systems

Cold wall design with showerhead
Excellent temperature uniformity
Up to 1200^oC

PECVD

PECVD

Excellent uniformity
High rate films
Excellent control of film properties

RIE Etching

RIE Etching

Anisotropic dry etching
Fast and consistent etching
High pumping capacity

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Latest news:

Oxford Instruments and Eindhoven University of Technology formalise…

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Significant investment into ALD technology for MicroLED & AR

Oxford Instruments supplies ALD technology for microLED to key UK manufacturer…

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Significant orders of our GaN ALE and ALD Systems

Oxford Instruments Receives Orders for GaN ALE and ALD Systems from Several…

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Advanced Metrology for SiC Crystal Quality Improvement

Oxford Instruments Confirms Crystal Quality Improvement for SiC Substrate…

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