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Deep Silicon Etching (DSiE) Systems

Development of our deep silicon etching (DSiE) technology delivers industry leading processes and offers the ultimate in process flexibility.

Products

The PlasmaPro 100 Estrelas platform is designed to give total flexibility for Deep Reactive Ion Etching (DRIE) applications - serving a diverse set of process requirements across the…

PlasmaPro 100 Estrelas DRIE

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