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Atomic Scale Processing

Our range of plasma processing systems provides a complete solution to Atomic Scale Processing. We provide unique cluster capability or stand alone systems enabling the manipulation of matter with atomic scale precision on a productions scale.

Driving innovation at the atomic scale

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ALD of dielectrics

Atomic layer deposition of dielectrics & metals with low damage

Atomic layer deposition
Atomic layer deposition of dielectrics & metals with low damage

Atomic layer deposition of dielectrics & metals with low damage

1D & 2D materials growth

Chemical Vapour Deposition & ALD of atomically thin structures: 1D & 2D materials

CVD growth of ZnO nanowires using DEZn precursors

CVD growth of ZnO nanowires using DEZn precursors.
(Courtesy of Nanoscience Centre, Univ. of Cambridge)

CVD growth of hBN

CVD growth of hBN

Atomic Layer Etch

Atomic layer etching of Silicon, GaN & 2D materials

Atomic layer etching
25nm wide Si trenches etched to 110nm depth by ALE, HSQ mask still in place

25nm wide Si trenches etched to 110nm depth by ALE, HSQ mask still in place

Download ALD brochure
Download 2D Nanofab brochure
Download ALE Flyer 2015

Atomic Scale Processing Systems