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Ionfab Ion Beam

Ionfab serves a diverse set of ion beam etch (IBE) and deposition (IBD) process requirements across a wide range of applications.

  • Single wafer or cluster wafer handling
  • Multiple mode functionality
  • Capable of clustering with other plasma systems
  • Dual-beam configuration
  • Very low surface film roughness
  • Unmatched batch uniformity
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Unique technology serving multiple applications

Ion beam technology provides an exceptionally versatile approach to etch and deposition by offering a single tool and maximising system utilisation.

 

Ion Beam Etching

  • Slanted etching
  • Laser facet etching
  • Magnetoresistive random access memory (MRAM)
  • Dielectric films
  • III-V photonics etching
  • Spintronics
  • Metal contact and track
  • Superconductors

Ion Beam Deposition

  • Laser facet coating including high- and anti-reflection
  • Ring laser gyroscope mirrors
  • X-ray optics
  • II-VI based infrared sensors
  • Infrared sensors (Vanadium oxide, II-VI)
  • Telecom filters

High quality Ion Beam Etching

Superior process repeatability and low cost of ownership make the Ionfab tool an excellent system that is configurable from R&D to batch production.

Key Benefits

  • Flexible configuration for advanced research applications
  • Unmatched uniformity and process reproducibility for production
  • Flexible wafer handling capability – single wafer load lock or cassette-to-cassette robotic handler

Etching Modes

  • Ion Beam Etching (IBE) / Ion Beam Milling
  • Reactive Ion Beam Etching (RIBE)
  • Chemically-assisted Ion Beam Etching (CAIBE)

Hardware Features

Wafer size 100 mm 200 mm
Etch RF source 15 cm 30 cm
Substrate rotation speed Up to 20 RPM
Substrate tilt angle -90° horizontal to +65° facing down
Platen temperature 10 °C to 300 °C chiller or heater configuration
IBE processing chamber schematic

 

Etch Ion Sources

  • Three-grid assembly designs
  • Grid designs tailored for specific etch requirements
  • Filamentless DC plasma bridge neutraliser (PBN) for low maintenance

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High quality Ion Beam Deposition

High vacuum operation allows Ion Beam Deposition to deliver thin films with high quality and excellent electrical and optical properties.

Key Benefits

  • High quality thin films with ultra-low contamination
  • High throughput with reduced footprint for lowest cost of operation
  • Unmatched batch uniformity and process reproducibility
  • Very accurate optical film thickness control
  • Very low surface film roughness

Deposition Modes

  • Ion Beam Sputter Deposition (IBSD)
  • Ion-assisted Sputter Deposition (IASD)
  • Reactive Ion Beam Deposition (RIBD)

Hardware Features

Wafer size 100 mm 200 mm
Deposition ion source 15 cm 15 cm
Substrate rotation speed Up to 20 RPM
Substrate tilt angle -90° horizontal to +65° facing down
Platen temperature 10 °C to 300 °C chiller or heater configuration
IBD processing chamber schematic

 

Deposition Key Features

  • Multiple targets with rotating shutter
  • Wide range of sputter target sizes with matching deposition ion source grid designs
  • Optional rotating and tiltable high speed substrate holder

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Superior performance in key applications

Augmented Reality Optical Combiners

  • Solution for etching surface-relief gratings for waveguide combiners on large processing area
  • Angled SiO2 grating using Ion Beam Etching (IBE) for precise angle control
  • Uniform angle control over 200 mm wafer size
  • Patent-filed solution to enable high-yield manufacturing

We have many years of expertise in etching the slanted feature on large areas. Our solutions are designed to deliver the manufacturing quality required for surface-relief gratings.

Our solution delivers market-leading uniformity for wafer sizes up to 200mm.

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Edge-emitting Lasers

  • Laser facet etching with option of angled facet etch for control over laser beam emission angle
  • High quality laser facet coating for high power laser
Laser image

Infrared Sensors

  • Good resistance repeatability for VOx film
  • Temperature coefficience of resistance shows no hysterisis
IR image

Global Customer Support

Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.

  • Remote diagnostics software provides quick and easy fault diagnosis and resolution
  • Support contracts are available to suit the budget and situation
  • Global spares in strategic locations for quick response

Contact Us Today For More Information

Speak to our experts or request pricing information today.

 

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