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Plasma Enhanced Chemical Vapour Deposition (PECVD)

PECVD is a well established technique for deposition of a wide variety of films. Many types of device require PECVD to create high quality passivation or high density masks.

Highlights

  • Top electrode RF driven (MHz and/or kHz); no RF bias on lower (substrate) electrode 
  • Substrate sits directly on heated electrode 
  • Gas injected into process chamber via “showerhead” gas inlet in the top electrode 
  • Film stress can be controlled by high/low frequency mixing techniques 
  • Lower temperature processes compared to conventional CVD

 

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    • SiOx, SiNx and SiOxNy deposition for a wide range of applications including photonics structures, passivation, hard mask, etc. 
    • Amorphous silicon (a-Si:H) 
    • TEOS SiO2 with conformal step coverage, or void-free good step coverage 
    • SiC 
    • Diamond-like carbon (DLC)Offers a wide range of material deposition, including:
  • Plasma cleaning process with end-point control removes or reduces need for physical/chemical chamber cleaning 
  • Control over film stoichiometry via process conditions

PlasmaPro 80 
PlasmaPro 800
PlasmaPro 100
PlasmaPro 1000
Electrode size
240mm 460mm 240mm 490mm
Substrates Up to 240mm diameter, multi-wafers or small pieces Up to 460mm diameter, multi-wafers or small pieces Up to 200mm diameter with carrier options available for multi-wafers or small pieces Up to 490mm diameter with carrier options available for multi-wafers or small pieces
Dopants No No Various dopants available which include PH<sub>3</sub>, B<sub>2</sub> H<sub>6</sub>, GeH<sub>4</sub> Various dopants available which include PH<sub>3</sub>, B<sub>2</sub>H<sub>6</sub>, GeH<sub>5</sub>
Liquid Precursors No Yes: TEOS
MFC controlled gas lines
4, 8 or 12 line gas box available
RF Switching for Stress Control Yes
Wafer stage temperature range 20°C to 400°C Standard 20°C to 400°C with option for up to 1200°C Standard 20°C to 400°C
Insitu plasma clean Yes. Endpoint available to ensure optimum clean time
Download PlasmaPro 80 Brochure
Download PlasmaPro 100 Brochure
Download PlasmaPro 800 Brochure
Download PlasmaPro 1000 Brochure

PECVD Systems