Part of the Oxford Instruments Group

High Quality Process for Indium Phosphide

To ensure the desired electronic performance, InP devices are manufactured using complex multistep epitaxial deposition, masking and plasma-etch processes. We offer a market-leading range of InP process solutions, from slow etch for fine features, such as gratings, to solutions for etching ultra-smooth structures, enabling engineers to master the fabrication of InP devices.

  • High-precision grating and waveguide etching using oxide mask type (mixture of CH4 and H2)
  • Vertical, smooth and clean sidewalls using silicon dioxide/nitride hard masks with broader use of etch chemistries such as Cl/ Ar
  • Control the critical dimensions and characteristics of the finished structure
  • Wafer-to-wafer repeatability and substrate transfer reliability
  • High-aspect ratio InP Etching with a straight and smooth profile

We have III-V plasma technology solutions for volume manufacturing and niche development. To see what the next level of InP processing looks like, click to read our article.

New Article in Compound Semiconductor

Advances in the processing of InP lasers and detectors will aid the growth of a third wave of connected devices, following in the footsteps of the computer and smartphone revolutions.

Written by Grant Baldwin and Mark Dineen for Compound Semiconductor magazine.

InP Process Solutions

InP enables the manufacture of components that can operate at high frequencies allowing higher volumes of data. Its superior electron mobility has established the (InP) a strong compound semiconductor material for the manufacturing of laser diodes, optoelectronics, high-frequency electronic, photonic integrated circuits and optical fibre for data communication. 

When design and fabrication are optimised, InP lasers provide high spectral purity and optical power, over a wide temperature range. The achievable wavelength range of 1100 – 2000 nm is optimal for fibre optic communications. Our Plasma Technologies enable you to produce reliable InP devices, reducing optical losses and achieving the highest yield and throughput.

InP Process Applications

InP Laser Facet
InP Waveguide Etch
InP Laser Facet
Grating Etch

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