To ensure the desired electronic performance, InP devices are manufactured using complex multistep epitaxial deposition, masking and plasma-etch processes. We offer a market-leading range of InP process solutions, from slow etch for fine features, such as gratings, to solutions for etching ultra-smooth structures, enabling engineers to master the fabrication of InP devices.

• High-precision grating and waveguide etching using oxide mask type (mixture of CH4 and H2)
• Vertical, smooth and clean sidewalls using silicon dioxide/nitride hard masks with broader use of etch chemistries such as Cl/Ar
• Control the critical dimensions and characteristics of the finished structure
• Wafer-to-wafer repeatability and substrate transfer reliability
• High-aspect ratio InP Etching with a straight and smooth profile

We have III-V plasma technology solutions for volume manufacturing and niche development. To see what the next level of InP processing looks like, click to read our article.