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Electrostatic Chuck

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Electrostatic Chuck

Electrostatic Chucks (ESCs) are widely used for clamping wafers by electrostatic charge as an alternative to traditional mechanical clamping methods. Multiple Oxford Instruments Plasma Technology (OIPT) systems utilise ESC clamps, including the Plasma Pro 100, Estrelas DSIE, and the Plasma Pro 100 Cobra.

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Electrostatic Chuck

The use of Electrostatic Chuck, rather than mechanical clamps, can provide many benefits, including:

  • Improved process uniformity
  • Increased device yield
  • ESC Quartz shielding for maximised processed wafer area
  • All upgrades include focus and sacrificial rings, which are designed to optimise lower costs of ownership
  • Simplified regular maintenance schedule
  • ESC upgrades include an end-effector to suit your requirements
  • Handler ESC upgrades include reteaching the handler
  • Designed with a single He layer
  • Puck directly cooled for improved heat transfer
  • Multi-layer textured ceramic
  • Designed to minimise edge effects

Fluid-cooled Electrostatic Chuck upgrades are available in 75mm, 100mm, 150mm, and 200mm sizes for Semi and Jeida-standard major flats.

Upgrade Timeline

Electrostatic Chuck upgrades are typically installed within just one day.

Upgrade Suitability

Electrostatic Chuck upgrades are available for our Plasma Pro 100, Estrelas DSIE, and Plasma Pro 100 Cobra platforms.


Please contact your local customer service sales team for more information, pricing, and a free consultation.

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