Welcome to this edition of Process News.

Oxford Instruments Plasma Technology provides leading edge tools and processes to key markets worldwide.

In this issue, we explore topics such as:

• Recent advances in SiC via etch
  process for RF device manufacture
• High quality MoS2 CVD
  growth process developed
• In-situ plasma pre-treatments on
  GaN surfaces for reduction of
  interface traps in metal-oxidesemiconductor
  capacitors & high
  electron mobility transistors using
  ALD Al2O3
• Precision 3-D nanomachining
  of silicon nanowires
• One dimensional contacts to a 2D
  material

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Read our latest Process News Newsletter here!