Ion Beam Deposition (IBD) & Reactive Ion Beam Deposition (RIBD)

An ion beam strikes and sputters a target of material, which then coats the substrate tilted toward the target with the sputtered material. The properties of the deposited film will depend on the target material properties and on the ion sputter beam parameters (flux, energy, etc.) as well as the chamber ion source-target-substrate configuration. Ion beam deposition can be used in two ways; IBD uses charged non reactive ions and RIBD uses reactive species to alter the film properties.

Features & benefits
Hardware

Key benefits

High quality thin film with ultra low contamination
High throughput with reduced footprint for lowest cost of operation
Unmatched batch uniformity and process reproducibility
Patented high speed substrate holder (up to 500RPM) equipped with a white light optical monitor (WLOM) design for very accurate in-situ optical film control
Very low surface film roughness

Deposition ion source features

Deposition ion source: 15cm, 13.56 MHz driven
Gas inlet through source, assist source and into the chamber
Multiple targets with rotating shutter
Wide range of sputter target sizes with matching deposition ion source grid designs
Rotating and tiltable high speed substrate holder

	Ionfab 300
Ion deposition source	150mm
Deposited area	Up to 200mm
Number of targets	Up to 4 targets
Platen size	Up to 8 inch wafer
End product detection	Dual Xtal monitors
Platen rotation	Up to 500rpm
Platen tilt angle	-90ºC to +75ºC
Platen heat	Embedded heaters up to 300ºC
Platen cooling	Helium
Assist or pre-clean source	150mm and 300mm RF ion source

Download Ionfab brochure

IBD systems

Website by Miramar Communications Ltd

Ion Beam Deposition (IBD) & Reactive Ion Beam Deposition (RIBD)

Highlights

Key benefits

Deposition ion source features

IBD systems