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Process News Spring 2015

Welcome to this edition of Process News.

Oxford Instruments Plasma Technology provides leading edge tools and processes to key markets worldwide.

In this issue, we explore topics such as:

  • Role of Plasma Enhanced Chemical Vapour
    Deposition (PECVD) in Thin Film Silicon
  • One of the largest semiconductor companies
    in Europe signs agreement for multiple Failure
    Analysis systems from Oxford Instruments
  • Getting a grip on sapphire etching: Novel
    clamping of sapphire looks to unleash
    brighter, cheaper LEDs
  • World leading graphene research at The
    University of Manchester uses our tools

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Read our latest Process News Newsletter here!