Process News Spring 2015

Welcome to this edition of Process News.

Oxford Instruments Plasma Technology provides leading edge tools and processes to key markets worldwide.

In this issue, we explore topics such as:

• Role of Plasma Enhanced Chemical Vapour
  Deposition (PECVD) in Thin Film Silicon
  Photovoltaics
• One of the largest semiconductor companies
  in Europe signs agreement for multiple Failure
  Analysis systems from Oxford Instruments
• Getting a grip on sapphire etching: Novel
  clamping of sapphire looks to unleash
  brighter, cheaper LEDs
• World leading graphene research at The
  University of Manchester uses our tools

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Read our latest Process News Newsletter here!