White Paper Enabling reliable normally-off recessed gate MISHEMT fabrication for power electronics applications
The combined solution of ALE and Etchpoint provide key processing and performance benefits that enable fabrication of device geometries previously deemed too challenging
Plasma technology is used in the fabrication of most semiconductor devices created today across a wide range of industries. It is able to provide unique solutions for the creation and manipulation of matter with atomic-scale accuracy.
High-performance, reliable and flexible systems across several etching & deposition technologies. Systems range from single load-lock R&D systems to full clusterable production systems for high volume manufacturing.