Oxford Instruments partners with Hakuto to expand advanced plasma…
Oxford Instruments is pleased to announce the appointment of Hakuto Co.,…
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Improve process insight, reduce downtime, and maintain tighter process control with continuous visibility into chamber chemistry. The MKS Vision 2000-C RGA delivers real-time monitoring of process gases throughout the process cycle, helping identify issues faster, thereby reducing process instability risk.
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Combining advanced mass spectrometry with automated process monitoring, the MKS Vision 2000-C RGA operates across a 1–300 amu mass range to detect process gases, reaction by-products, contaminants, and leaks with exceptional precision.
Key benefits
Ideal for semiconductor manufacturers seeking deeper process insight across multiple plasma processes, from R&D environments to high-volume production.
Talk to a regional service sales specialist today and discover how real-time residual gas analysis can improve process insight, accelerate troubleshooting, and optimise process performance.
Contact us for a quotationPTIQ is the latest intelligent software solution for PlasmaPro and Ionfab processing equipment.
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