Process News Spring 2016

Welcome to this edition of Process News.

Oxford Instruments Plasma Technology provides leading edge tools and processes to key markets worldwide.

In this issue, we explore topics such as:

• Recent advances in SiC via etch
  process for RF device manufacture
• High quality MoS2 CVD
  growth process developed
• In-situ plasma pre-treatments on
  GaN surfaces for reduction of
  interface traps in metal-oxidesemiconductor
  capacitors & high
  electron mobility transistors using
  ALD Al2O3
• Precision 3-D nanomachining
  of silicon nanowires
• One dimensional contacts to a 2D
  material

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Read our latest Process News Newsletter here!