Enabling the SiC revolution: Plasma processing for better performance

Ion Beam Deposition Enables High Power Lasers

Dr David Pearson and Joao Ferreira discuss the deposition of laser bar coatings and give a brief introduction ...

Atomic Scale Processing

Dr Ravi Sundaram and Dr Harm Knoops discuss the processing of atomic scale materials and devices including Graphene and 2D materials, atomic layer etching...

Fabrication of biomedical devices for on chip analysis and diagnostics

Optimising ALD High-k Oxides for Novel Applications

Dr Uwe Schroeder and Dr Harm Knoops will disuss the ALD of ferroelectric HfO2 for novel memory applications ...

ALD for 2D Materials

Dr Knoops and Dr Neumaier discuss how ALD can be used to grow various materials such as dielectrics on 2D materials and how it can also be used...

Semiconductor Failure Analysis Solutions

This webinar will expand on how Oxford Instruments solutions can enable you to overcome failures and other challenges.

InP Laser Manufacturing

Dr Mark Dineen and Dr Owain Thomas discuss how plasma etching can be use to get the most from your devices with the highest yield.

PSS Etching

This presentation describes the approaches taken to increasing productivity in LED production, by increasing both process rates and...

Light Enables Light

Dr Katie Hore and Stephanie Baclet will discuss the key elements required to reliably manufacture GaAs/AlGaAs VCSELs.

SiC Via Etching

Dr Mark Dineen describes cutting edge technology that offers several process capabilities suited to the SiC via application.

2D Materials Beyond Graphene

Focuses on recent advances in growth of these materials as well as Raman characterisation & elucidate the...