Part of the Oxford Instruments Group
Enabling the SiC Revolution: Plasma Processing for Better Performance

20 February 2019 at 3PM (GMT)

About This Webinar

We have developed an innovative set of plasma process solutions designed to enable maximum Silicon Carbide (SiC) device performance.

In this webinar you will learn our top five tips on how plasma etch and deposition play an essential role in making great devices:

  • How surface preparation using plasma etching is used to help grow high-quality device layers
  • Mask deposition and etching using PECVD for high-density masks
  • Using high etch rate etching of mesas and trenches using high-density plasma etching for high throughput and low COO
  • Understanding how etch profile plays an essential role
  • Deposition of barrier layers to improve interfaces and increase device efficiency
Dr Mark Dineen

Dr Mark Dineen
Technical Marketing Manager

Dr Mark Dineen has over 20 Years of plasma processing experience. His more recent work includes applying this knowledge to a wide range of devices from semiconductor lasers to GaN-based RF devices.

Mark is now an Experienced Technical Marketing Manager with a demonstrated history of communicating complex technical ideas and scientific concepts to a varied audience. These technologies include ALD, ALE, CVD, ICP, PECVD and RIE plasma processing and cover how these can deliver device solutions to our customers.

Related Content