Our ion beam deposition products are chosen for their ability to produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides an exceptionally versatile approach to etch and deposition by offering a single tool and maximising system utilisation. Our systems have flexible hardware options including open load, single substrate load lock and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.
Multiple mode functionality
The Ionfab300 is available in standard or large chamber, tailored for both etch and deposition applications
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
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