Atomfab is a revolutionary, high-performance PE-ALD system specifically designed for your production needs.
Atomic layer deposition (ALD) technology behind Atomfab offers precisely-controlled ultra-thin films for advanced applications on the nanometre scale, with conformal coating into high aspect ratio structures.
Sub-second cycle times
Excellent film uniformity and repeatability
Low substrate damage
Excellent maintenance with MTBF and MTTC
High material quality
Low particle counts
Clusterable with automated casette to casette wafer handling
Atomfab offers unique capability in engineering nanoscale structures and devices by combining remote and thermal plasma ALD processes. Download your free brochure below or contact one of our ALD experts for more information.
UNIQUE HARDWARE CAPABILITY Atomfab is designed for production from the ground-up, with powerful features and hardware as standard plus many options to upgrade specific parts of the system.
Loadlock with purged loading area
Compact remote plasma source up to 200°C
Excellent precursor and process control
200mm wafer electrode up to 400°C, with option for RF biased and temperatures up to 600°C available
Optional Turbomolecular pump
Extensive process capability
Easy access to precursor cabinet, with glovepanel option available
On-board gas pod with 5 MFC controlled gases
Atomfab offers fast, high-quality process solutions with excellent cost of ownership for high-volume manufacturing.
Six times faster than conventional remote plasma
Throughput at 7,000 200mm wafer per month (20nm ALD Al
2O 3 for single chamber) Sub-second range throughput whilst offering ultra-low damage processing
High-quality plasma ALD films, with high breakdown voltage and uniformity
Reliability and repeatability with 10ms data logging of process parameters
Rear access to onboard gas pod, MFC and precursors for ease access servicing
Patented remote source specifically designed for atomic scale processing
Low damage for sensitive substrates to maximise device performance
Fast cycle times and reliability thanks to uniform plasma exposure and short 80ms strike time
Low damage (remote)
Short plasma exposure
Short precursor & dose
Small ICP Yes
Direct CCP No
Large ICP Yes
Large ECR Yes
Compact Remote Yes
Revolutionary Plasma Source
Atomfab uses a patent pending remote source specifically designed for atomic scale processing.
Low damage for sensitive substrates for maximum device performance
Fast cycle times and reliablity with uniform plasma exposure and film deposition
Short plasma times (250ms) enabled by patent-pending AMU
Short strike time (80ms) for high throughput
Reproducible strike time and low reflected power for high yield
Global Customer Support
Oxford Instruments is committed to providing a comprehensive, flexible and reliable global customer support. We offer excellent quality service throughout the life of your system.
Remote diagnostics software provides quick and easy fault diagnosis and resolution.
Support contracts are available to suit the budget and situation.
Global spares in strategic locations for quick response.
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