Part of the Oxford Instruments Group
Expand
Oxford Instruments
Applications
Products
News
Events
Contact
SustainabilityInvestorsCareersNewsEventsContact
Investors Careers
About Us
Our FacilityNewsEventsSolutions for ProductionSolutions for Research
Markets
2D MaterialsAugmented RealityBiomedical DevicesFailure Analysis
HBLEDsInfrared SensorsLasersVCSELs
MEMS & SensorsPower DevicesQuantum TechnologyRF Devices
Technologies
Plasma EtchingReactive Ion EtchingRIE-PEICP Etching
Ion Beam
IBDIBE
Plasma deposition
PECVDICPCVDCVD
Atomic scale
Atomic Layer DepositionAtomic Layer EtchingAtomic Scale Processing
Materials & ProcessesSiCSiO2Al2O3CrAlGaN/GaNBrowse more...
Products
ICP EtchPlasmaPro 80 ICPPlasmaPro 100 CobraPlasmaPro 100 PolarisRIEPlasmaPro 80 RIEPlasmaPro 100 RIEPlasmaPro 800 RIE
Deep Si Etch
PlasmaPro 100 Estrelas
PECVDPlasmaPro 80 PECVDPlasmaPro 100 PECVDPlasmaPro 800 PECVDICPCVDPlasmaPro 80 ICPCVDPlasmaPro 100 ICPCVDCVDPlasmaPro 100 Nano
ALDAtomfabFlexAL
ALE
PlasmaPro 100 ALE
Ion Beam
Ionfab IBEIonfab IBD
PTIQ Advert
Library
BlogProcess NewsVideosWebinarsWhite PapersCustomer Gallery
Support
Service & Support
Service AgreementsUpgrades & SoftwareNEW: PTIQ SoftwareSparesTrainingTeamviewer
Raise a Support Ticket
Contact Us
PTIQ
Contact Us
Shop
UK
News
Events
Contact
eCommerce
  1. Home
  2. Processes
  3. PI

Polyimide

Polyimide (PI) is a polymer of imide monomers. PI may be dry-etched using Inductively Coupled Plasma (ICP) etching and Reactive Ion Etching (RIE).

Polyimide
More on ICP Request more information
More on RIE Request more information

Related Products

PlasmaPro 100 RIE
PlasmaPro 100 Cobra ICP Etch

© Oxford Instruments 2020

Website by Miramar Communications Ltd