Niobium

Niobium (Nb) and its alloys are used to make superconducting devices. It may be dry-etched using Inductively Coupled Plasma (ICP) or Reactive Ion Etching (RIE).

ICP
RIE

Wafer size: up to 100mm
- Product: PlasmaPro 100

More on ICP Request more information

Wafer size: up to 200mm
- Product: PlasmaPro 100 & PlasmaPro 80
Wafer size: up to 300mm
- Product: PlasmaPro 800

More on RIE Request more information

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