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White Paper: Defining an optimal plasma processing toolkit for Indium Phosphide (InP) laser diode production

In this white paper we examine the role of plasma processing technologies in InP laser diode manufacture focusing on the relative merits of inductively coupled plasma chemical vapour deposition (ICPCVD), plasma enhanced CVD (PECVD), reactive ion etching (RIE) and ICP-RIE. A primary aim is to highlight the relevant characteristics of different processes and show how they can be optimally applied, in combination, to efficiently fabricate high performance lasers.

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Date: N/A

Author: Oxford Instruments Plasma Technology

Category: Whitepaper

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