This entry was created on the Oxford Instruments Plasmalab 100 system. It was chosen not only for its visual impact but also the complexity of the structure with different features etched simultaneously, a great combination of art and science.
The competition was an exciting opportunity to celebrate and show case the achievements of our customers with SEMs. We are proud that the our plasma processing equipment was used to create these results.
Thank you to everyone who entered!
The SEM image shows a two-stage laser driven electron accelerator on a chip. The first structure (left-bottom) bunches the incoming electrons which are traversing through the pillars. The second structure (right-top) accelerates those bunched electrons with a gradient as high as 200 MeV/m. Such a device can revolutionize the future of particle accelerators by miniaturizing them on chips. To fabricate such structures, we choose silicon as the substrate. We create the wafer pattern and then use an Oxford Instruments Plasmalab system 100 to perform an anisotropic etch. By optimizing the process, we achieve a balance condition where chemical reactions and physical ion bombardments are perfectly under control to achieve an optimised anisotropic etching. Dr Yousefi will be receiving a £200 Amazon Gift Voucher for his achievements.
Submitted by: Dr Peyman Yousefi, Friedrich Alexander University of Erlangen Nuremberg
We had many interesting and creative entries who all deserved to be commended for their achievement so our judges selected three runners up who will each be receiving £30 Amazon Vouchers. Click on the images to find out more.
Faraday cage angled-etching of nano-beams in bulk of single crystal quartz.
Silicon porous nanopillars
Rotation: the rotation of nanofin structures which creates a Pancharatnam–Berry phase for metalens applications
Plasma etching is an essential tool in today’s world, enabling many of the technologies we take for granted. For example, the smartphone would not be possible without it.